منابع مشابه
Ion Beam Assisted Deposition of Thin Epitaxial GaN Films
The assistance of thin film deposition with low-energy ion bombardment influences their final properties significantly. Especially, the application of so-called hyperthermal ions (energy <100 eV) is capable to modify the characteristics of the growing film without generating a large number of irradiation induced defects. The nitrogen ion beam assisted molecular beam epitaxy (ion energy <25 eV) ...
متن کاملEffect of bias voltage on structural and mechanical characteristics of diamond-like carbon thin film applied by ion beam deposition
This study, investigates the effect of bias voltage on structural changes of diamond-like carbon thin film created by ion beam deposition is investigated. For this purpose, the bias voltage in the values of 0 V, -50 V, -100 V and -150 V on the AA5083 aluminum alloy was considered. Raman spectroscopy was used to evaluate structural. Influence of the bias voltage on the thickness and roughness of...
متن کاملComparative study of IR and UV laser damage resistance of silica thin films deposited by Electron Beam deposition, Ion Plating, Ion Assisted Deposition and Dual Ion Beam Sputtering
The laser damage resistance of optical coatings is a critical point for a large number of applications. However improving this resistance is often hard to obtain because of the large number of parameters in the deposition processes than can modify the laser damage threshold and the lack of detailed and exploitable studies published on this subject. Then, the aim of this work is to test and anal...
متن کاملLaser damage resistance of silica thin films deposited by Electron Beam Deposition, Ion Assisted Deposition, Reactive Low Voltage Ion Plating and Dual Ion Beam Sputtering
The laser damage resistance of optical coatings is a key point for a large number of applications. The aim of this work is to test and analyze the laser damage resistance of a thin film material commonly used for high power applications (SiO2) and deposited with different techniques: Electron Beam Deposition, Ion Assisted Deposition, Low Voltage Reactive Ion Plating and Dual Ion Beam Sputtering...
متن کاملAchieving Improved Optical Thin Film Control and Uniformity of Silicon Dioxide by Using Ion Assisted Deposition
We have found that the deposition of critical optical thin film stacks with silicon dioxide from an electron beam gun is severely limited by the stabilty of the evaporation pattern of the material. We had not obtained satisfactory results in some of the more demanding applications with either solid or granular starting material. The amount of material deposited on a central monitor chip or cont...
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ژورنال
عنوان ژورنال: Journal of Advanced Science
سال: 1990
ISSN: 1881-3917,0915-5651
DOI: 10.2978/jsas.2.4_218